JPS6182433A - 微動機構 - Google Patents
微動機構Info
- Publication number
- JPS6182433A JPS6182433A JP59204821A JP20482184A JPS6182433A JP S6182433 A JPS6182433 A JP S6182433A JP 59204821 A JP59204821 A JP 59204821A JP 20482184 A JP20482184 A JP 20482184A JP S6182433 A JPS6182433 A JP S6182433A
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- drive
- members
- fine movement
- moving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007246 mechanism Effects 0.000 title claims description 19
- 230000033001 locomotion Effects 0.000 claims abstract description 40
- 230000009471 action Effects 0.000 claims description 8
- 230000008602 contraction Effects 0.000 claims description 8
- 239000010410 layer Substances 0.000 claims 1
- 239000002344 surface layer Substances 0.000 claims 1
- 238000003754 machining Methods 0.000 abstract description 6
- 230000001105 regulatory effect Effects 0.000 abstract 3
- 238000006073 displacement reaction Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000013518 transcription Methods 0.000 description 2
- 230000035897 transcription Effects 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59204821A JPS6182433A (ja) | 1984-09-29 | 1984-09-29 | 微動機構 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59204821A JPS6182433A (ja) | 1984-09-29 | 1984-09-29 | 微動機構 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6182433A true JPS6182433A (ja) | 1986-04-26 |
JPH0358855B2 JPH0358855B2 (en]) | 1991-09-06 |
Family
ID=16496938
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59204821A Granted JPS6182433A (ja) | 1984-09-29 | 1984-09-29 | 微動機構 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6182433A (en]) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0197538A (ja) * | 1987-10-06 | 1989-04-17 | Nec Corp | 位置決め機構 |
JPH01109047A (ja) * | 1987-10-20 | 1989-04-26 | Nec Corp | 位置決め機構 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55157451A (en) * | 1979-05-21 | 1980-12-08 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Positioning device |
JPS58190079A (ja) * | 1982-04-28 | 1983-11-05 | Toshiba Corp | 微動機構 |
-
1984
- 1984-09-29 JP JP59204821A patent/JPS6182433A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55157451A (en) * | 1979-05-21 | 1980-12-08 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Positioning device |
JPS58190079A (ja) * | 1982-04-28 | 1983-11-05 | Toshiba Corp | 微動機構 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0197538A (ja) * | 1987-10-06 | 1989-04-17 | Nec Corp | 位置決め機構 |
JPH01109047A (ja) * | 1987-10-20 | 1989-04-26 | Nec Corp | 位置決め機構 |
Also Published As
Publication number | Publication date |
---|---|
JPH0358855B2 (en]) | 1991-09-06 |
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